ALD（原子层沉积，Atomic Layer Deposition）设备是一种先进的薄膜制备技术。设备通过将两种前驱体以气体脉冲的形式交替引入反应器，两种前驱体之间靠真空泵抽取或惰性气体吹扫实现隔离，前驱体分子通过吸附在样品表面发生反应生成薄膜或团簇。即利用交替 ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

With each transition to a new technology node, fab requirements for metal and particle contamination become more stringent, posing challenges for existing coating methods such as anodization or plasma ...