Silicon nitride (Si3N4) etching is a critical process step in the fabrication of three-dimensional NAND flash memories, where vertically stacked layers demand exceptional process precision. The ...

An international group of scientists investigated the use of silicon dioxide (SiO2) and zirconium dioxide (ZrO2) as an anti-reflection coating for polycrystalline silicon solar cells. “The primary ...

Korean scientists utilized an anti-reflective coating based on silicon dioxide (SiO2) nanoparticles and large phosphor particles to increase diffuse light transmittance in a tandem perovskite-silicon ...